Wafer Preparation: Silicon wafers are cleaned and prepared for processing. This includes polishing the surface to create a smooth foundation and applying a thin layer of silicon dioxide (SiO2) or another dielectric material as insulation.
Deposition: Various layers of materials, such as polysilicon, metal, insulators, and dielectrics, are deposited onto the wafer using techniques like chemical vapor deposition (CVD), physical vapor deposition (PVD), or atomic layer deposition (ALD).
Photolithography: A photosensitive material, called photoresist, is applied to the wafer, followed by exposure to ultraviolet light through the photomask. This creates a patterned image on the photoresist.
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